The ACP Max™ system allows for collection of 30 mL, 60 mL, or 90 mL of whole blood for the preparation of platelet-rich plasma (PRP). Using a double-spin regimen, this buffy–coat-based system creates a PRP solution depleted of red blood cells and granulocytes, including neutrophils.1 Additional whole blood in the ACP Max PRP system encourages …

The AP Batch Series: Compact system chassis and 13.56 MHz RF generator with impedance matching for unparalleled process repeatability. Supports a range of process gases, including argon, oxygen, nitrogen, helium, and fluorinated gases. An intuitive touchscreen control panel for real-time access to process and production data for …

Proven Systems, Outstanding Service. Our selection of products is not only of the highest quality, but is also available in a variety of options to ensure you find exactly what you're looking for; Plasma Cutting Edge Machine with XD Beveling Head and the Heavy-Duty Oxy-Fuel System. We keep developing the new features to take our products to ...

The AW-B3000 batch, barrel photoresist asher is an manual load tool designed as a flexible 13.56 MHz RF plasma photoresist removal and system for high-volume wafer fabrication. AW-B3000 is in direct …

In this study, tetrafluoromethane (CF 4) plasma-treatments of polymethylmethacrylate (PMMA) powder were performed using a polygonal barrel-plasma-treatment system to improve the PMMA's hydrophobicity.Characterization of the treated samples showed that the PMMA particle surfaces were fluorinated by the CF 4 …

DESIGNED WITH A LARGER SWEET SPOT the Plasma USA Baseball Youth Bat (-9) will help hitters make better contact at the plate. HIGH-STRENGTH, HIGH PERFORMANCE this single piece aluminum design is constructed from aerospace-grade alloy materials. LARGEST ALLOWABLE 2 5/8" BARREL delivering a massive sweetspot …

L3075 3-Gas plasma asher/stripper system, consisting of: Manufacturer. Branson/IPC. Model. L3075. Asher Type. Barrel. Chamber Construction. Quartz 12″ (dia) x 20″ eep.

Barrel etchers are older technologies that were commonly used for photoresist strip, isotropic silicon nitride removal, silicon etching for solar cells, and plasma cleaning. Figure 1 shows a schematic of a barrel etcher. The etching process in these systems is fast and causes minimal substrate damage.

LFE Plasma Systems PP-151-9 Plasma Asher Plasma descum Dry Asher Dry Clean D380-019 Original Equipment Manufacturer: LFE Condition: AS IS,WHERE IS ( Refurbished by seller is optional at extra charge) Valid Time: Subject to prior sale Lead Time: Ready to go Location: Silicon Valley, CA, U.S.A. Warranty: N/A

Branson S3100 Barrel Asher consisting of: Model: S3100. Branson PM112-1500 Watt Generator. Branson 4000C Controller. Automatic, one channel, plasma barrel etcher. One process gas input. Quartz chamber (12″ …

Isotropic plasma is multi-directional and engulf an entire 3-D object within the plasma (see Anatech USA Quartz Barrel ICP Systems). Gas Plasma processing has several advantages over wet chemical processing. Surface tension phenomena of the liquid are eliminated, as is bubble formation, which may cause incomplete wetting. ...

Insert the CPC plug into your Hypertherm Plasma Power Supply. Plug the longer cable barrel connector into the CrossFire Electronics Torch On/Off port. If you have an LS-THC unit for your Machine, plug the shorter cable …

Section snippets Sample preparation. The CF 4 plasma-treatment was conducted using our novel barrel-plasma-treatment system [14]. Samples were treated using the following process: First, polystyrene powder (SBX-12, Sekisui Plastics Co., Ltd., 12 μm average particle diameter, 2 g) was introduced into the barrel, before the barrel …

Plasma Systems – A Brief Overview. A wide selection of plasma systems is currently available. These range from modified microwave ovens, to more serious process …

Stripping Photoresist. The Plasmod system is useful for stripping photoresist from wa- Oxygen plasma effectively removes photoresist from silicon or GaAs wafers. The …

Plasma treatment in low-pressure range. Start an inquiry. In the low-pressure plasma technology, gas is excited in a vacuum by supply of energy. This results in energetic ions and electrons, as well as other reactive particles, which constitute the plasma. It can be used to effectively alter surfaces.

The IoN 40 Plasma System is a barrel plasma reactor designed for R&D and production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson IPC, Dionex, Gasonics, Metroline, TePla and finally PVA TePla.

Because of the higher arc energy, high-definition plasma achieves superior cut quality on materials up to 50 mm (2") with superior cut edge angularity, narrower kerf, and higher cut speeds than conventional plasma cutting technology. It's not uncommon with these systems to achieve cut part accuracies within the +/- 0.25 mm (0.010") range.

Barrel reactor. Also described as "tube or tunnel reactor". Cylindrical plasma system through which the process gas flows in axial direction. With HF excitation by MHz …

The heating effect of the plasma was monitored using an infrared thermographic camera, the maximum barrel temperature after 30 min treatment found to be 29 °C. While the current barrel plasma system design can treat 20 g of polymer the system design has the potential to be readily scalable for the activation of larger batches …

PHOTORESIST ASHING IoN 10V. SINGLE WAFER ASHING SYSTEM The Photoresist Ashing IoN 10V plasma system is a manual load single wafer RF plasma Ashing,…. Photoresist Ashing equipment for wafer ashing and descum processing in the semiconductor industry for various photoresist types including SU-8 photoresist.

The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications. Customer is responsible for facility, pump and chiller if applicable. Key Features include: Plug and play self installation. Industrial computer with LCD touch panel and keyboard. Windows based operating system.

The PlasmaSTAR® Series of Plasma Processing Systems from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design …

Plasma cutting and gouging systems. Plasma is one of the world's most popular metal cutting methods for good reason: it strikes the perfect balance between cut quality, cut …

Barrel plasma etcher. High etching rates with anisotropic plasma etching can be achieved primarily in the barrel reactor with HF excitation in a MHz band. For this reason, plasma systems intended primarily or exclusively …

We supply a wide range of configurable Plasma Etch Systems for both chemical etching and physical etching applications, such as photoresist removal and improving the wettability of fluoropolymers such as PTFE. Chemical plasma etching is used to 'roughen' a surface on the microscopic scale. The surface of the component is etched with a ...

The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson ICP, Dionex, Gasonics, Metroline, TePla and finally PVA TePla.